四(二甲氨基)钛(IV)
四(二甲氨基)钛(IV)结构式
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常用名 | 四(二甲氨基)钛(IV) | 英文名 | Titanium(IV) dimethylamide |
|---|---|---|---|---|
| CAS号 | 3275-24-9 | 分子量 | 224.17000 | |
| 密度 | 0.947 | 沸点 | 50ºC (0.5 mmHg) | |
| 分子式 | C8H24N4Ti | 熔点 | <4ºC | |
| MSDS | 中文版 美版 | 闪点 | -5ºC | |
| 符号 |
GHS02, GHS05 |
信号词 | Danger |
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The influence of structure and processing on the behavior of TiO2 protective layers for stabilization of n-Si/TiO2/Ni photoanodes for water oxidation.
ACS Appl. Mater. Interfaces 7 , 15189-99, (2015) Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) ont... |
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J. Appl. Phys. 102 , 083521/1, (2007)
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Chem. Mater. 8 , 2712, (1996)
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