ACS Nano 2015-11-24

Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters.

Huan H Cao, Nako Nakatsuka, Andrew C Serino, Wei-Ssu Liao, Sarawut Cheunkar, Hongyan Yang, Paul S Weiss, Anne M Andrews

文献索引：ACS Nano 9 , 11439-54, (2015)

全文：HTML全文

摘要

Nucleotide arrays require controlled surface densities and minimal nucleotide-substrate interactions to enable highly specific and efficient recognition by corresponding targets. We investigated chemical lift-off lithography with hydroxyl- and oligo(ethylene glycol)-terminated alkanethiol self-assembled monolayers as a means to produce substrates optimized for tethered DNA insertion into post-lift-off regions. Residual alkanethiols in the patterned regions after lift-off lithography enabled the formation of patterned DNA monolayers that favored hybridization with target DNA. Nucleotide densities were tunable by altering surface chemistries and alkanethiol ratios prior to lift-off. Lithography-induced conformational changes in oligo(ethylene glycol)-terminated monolayers hindered nucleotide insertion but could be used to advantage via mixed monolayers or double-lift-off lithography. Compared to thiolated DNA self-assembly alone or with alkanethiol backfilling, preparation of functional nucleotide arrays by chemical lift-off lithography enables superior hybridization efficiency and tunability.