Tetrakis(ethylmethylamino)hafnium structure
|
Common Name | Tetrakis(ethylmethylamino)hafnium | ||
|---|---|---|---|---|
| CAS Number | 352535-01-4 | Molecular Weight | 410.89900 | |
| Density | 1.324 | Boiling Point | 79ºC0.1 mm Hg(lit.) | |
| Molecular Formula | C12H32HfN4 | Melting Point | <-50ºC | |
| MSDS | Chinese USA | Flash Point | 52 °F | |
| Symbol |
GHS02, GHS07 |
Signal Word | Danger | |
| Name | ethyl(methyl)azanide,hafnium(4+) |
|---|---|
| Synonym | More Synonyms |
| Density | 1.324 |
|---|---|
| Boiling Point | 79ºC0.1 mm Hg(lit.) |
| Melting Point | <-50ºC |
| Molecular Formula | C12H32HfN4 |
| Molecular Weight | 410.89900 |
| Flash Point | 52 °F |
| Exact Mass | 412.20900 |
| PSA | 12.96000 |
| LogP | 1.60960 |
| Storage condition | 2-8°C |
| Symbol |
GHS02, GHS07 |
|---|---|
| Signal Word | Danger |
| Hazard Statements | H225-H261-H315-H319-H335 |
| Supplemental HS | Reacts violently with water. |
| Precautionary Statements | P210-P231 + P232-P261-P305 + P351 + P338-P422 |
| Personal Protective Equipment | Eyeshields;Faceshields;full-face respirator (US);Gloves;multi-purpose combination respirator cartridge (US);type ABEK (EN14387) respirator filter |
| Hazard Codes | F: Flammable;Xi: Irritant; |
| Risk Phrases | R11 |
| Safety Phrases | 16-26-36 |
| RIDADR | UN 3398 4.3/PG 2 |
| WGK Germany | 3 |
| Packaging Group | II |
| Hazard Class | 4.3 |
| HS Code | 2921199090 |
| HS Code | 2921199090 |
|---|---|
| Summary | 2921199090 other acyclic monoamines and their derivatives; salts thereof VAT:17.0% Tax rebate rate:9.0% Supervision conditions:none MFN tariff:6.5% General tariff:30.0% |
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In situ reaction mechanism studies on ozone-based atomic layer deposition of Al(2)O(3) and HfO(2).
ACS Appl. Mater. Interfaces 2 , 347, (2010) The mechanisms of technologically important atomic layer deposition (ALD) processes, trimethylaluminium (TMA)/ozone and tetrakis(ethylmethylamino)hafnium (TEMAH)/ozone, for the growth of Al(2)O(3) and... |
| TEMAH |
| MFCD03427130 |
| TEMAH (Tetrakis(ethylmethylamino)hafnium(IV) |