Tetrakis(dimethylamido)hafnium
Modify Date: 2025-08-26 07:46:06
Tetrakis(dimethylamido)hafnium structure
|
Common Name | Tetrakis(dimethylamido)hafnium | ||
|---|---|---|---|---|
| CAS Number | 19782-68-4 | Molecular Weight | 354.79300 | |
| Density | 1.098 g/mL at 25 °C | Boiling Point | 6.1ºC at 760 mmHg | |
| Molecular Formula | C8H24HfN4 | Melting Point | 26-29ºC(lit.) | |
| MSDS | Chinese USA | Flash Point | 109 °F | |
| Symbol |
GHS02, GHS05 |
Signal Word | Danger | |
| Name | tetrakis(dimethylamido)hafnium(iv), |
|---|---|
| Synonym | More Synonyms |
| Density | 1.098 g/mL at 25 °C |
|---|---|
| Boiling Point | 6.1ºC at 760 mmHg |
| Melting Point | 26-29ºC(lit.) |
| Molecular Formula | C8H24HfN4 |
| Molecular Weight | 354.79300 |
| Flash Point | 109 °F |
| Exact Mass | 356.14700 |
| PSA | 12.96000 |
| LogP | 0.04920 |
| Appearance of Characters | crystal | colorless to pale yellow |
| InChIKey | ZYLGGWPMIDHSEZ-UHFFFAOYSA-N |
| SMILES | C[N-]C.C[N-]C.C[N-]C.C[N-]C.[Hf+4] |
| Symbol |
GHS02, GHS05 |
|---|---|
| Signal Word | Danger |
| Hazard Statements | H228-H261-H314 |
| Supplemental HS | Reacts violently with water. |
| Precautionary Statements | P210-P231 + P232-P280-P305 + P351 + P338-P370 + P378-P402 + P404 |
| Personal Protective Equipment | Eyeshields;Faceshields;full-face particle respirator type N100 (US);Gloves;respirator cartridge type N100 (US);type P1 (EN143) respirator filter;type P3 (EN 143) respirator cartridges |
| Hazard Codes | F: Flammable;C: Corrosive; |
| Risk Phrases | R11 |
| Safety Phrases | 6-26-36/37/39-43-45 |
| RIDADR | UN 3396 4 |
| WGK Germany | 3 |
|
Appl. Phys. Lett. 91 , 193503, (2007)
|
|
|
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films Hausmann DM, Gordon RG
J. Cryst. Growth 249 , 251-261, (2003)
|
|
|
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition Monsma D, Becker J
Material Matters 1(3) , 5, (2006)
|
| MFCD01862473 |