Abstract Phosphonoalkylation of trisubstituted chlorosilanes in the presence of excess i-Pr 2 NLi has been examined to establish the steric acid and electrophilic properties of each silane. A similar sequence has been developed for the introduction of two Si (CH 3) 3 groups. The Si C bond cleavage clearly demonstrates the protecting effect of trisubstituted silyl groups; but the silyl groups do not influence the formation of vinylphosphonates in the ...