The Journal of Organic Chemistry

Chemistry of organosilicon compounds. 261. Photochemical 1, 3-silyl migration in allylsilanes occurring with inversion of silyl configuration

M Kira, T Taki, H Sakurai

文献索引：Kira, Mitsuo; Taki, Takayuki; Sakurai, Hideki Journal of Organic Chemistry, 1989 , vol. 54, # 24 p. 5647 - 5648

全文：HTML全文

被引用次数: 15

摘要

Summary: In apparent disagreement with the prediction by the Woodward-Hoffmann rule, facile intramolecular 1,341~ 1 migration of allyl-and propargylsilanes with aromatic substituents at the silicon atom took place reversibly in various solvents under irradiation with 254-nm light, accompanied by the inversion of the silyl configuration.