Indium (III) compounds containing the neopentyl substituent, In (CH2CMe3) 3, In (CH2CMe3) 2Cl, In (CH2CMe3) Cl2, and In (CH2CMe3) 2CH3. Crystal and …

OT Beachley Jr, EF Spiegel, JP Kopasz…

文献索引：Beachley, O. T. Jr.; Spiegel, Ella F.; Kopasz, John P.; Rogers, Robin D. Organometallics, 1989 , vol. 8, p. 1915 - 1921

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被引用次数: 30

摘要

Organometallic chemical vapor deposition (OMCVD) is one of the most useful techniques for making compound semiconductors2 such as InP. The most desirable organometallic sources for OMCVD should be easily prepared, readily purified volatile liquids with excellent stability at room temperature. A number of homoleptic organoindium (II1) compounds (InR3, R= Me, 3 Et+ 5 n-Pr, 5 (1)(a) State Univeristy of New York at Buffalo.(b) Northern Illinois ...