Indium (III) compounds containing the neopentyl substituent, In (CH2CMe3) 3, In (CH2CMe3) 2Cl, In (CH2CMe3) Cl2, and In (CH2CMe3) 2CH3. Crystal and …

OT Beachley Jr, EF Spiegel, JP Kopasz…

Index: Beachley, O. T. Jr.; Spiegel, Ella F.; Kopasz, John P.; Rogers, Robin D. Organometallics, 1989 , vol. 8, p. 1915 - 1921

Full Text: HTML

Citation Number: 30

Abstract

Organometallic chemical vapor deposition (OMCVD) is one of the most useful techniques for making compound semiconductors2 such as InP. The most desirable organometallic sources for OMCVD should be easily prepared, readily purified volatile liquids with excellent stability at room temperature. A number of homoleptic organoindium (II1) compounds (InR3, R= Me, 3 Et+ 5 n-Pr, 5 (1)(a) State Univeristy of New York at Buffalo.(b) Northern Illinois ...