Journal of Organometallic Chemistry

Organometallic photochemistry photochemistry of some acyclic ketosilanes

HG Kuivila, PL Maxfield

文献索引：Kuivila,H.G.; Maxfield,P.L. Journal of Organometallic Chemistry, 1967 , vol. 10, p. 41 - 51

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被引用次数: 14

摘要

Abstract Photolysis of a series of silyl ketones with the general structure (CH 3) 3 Si (CH 2) n COR with n= 0–4, R= C 6 H 5 and with n= 0–3, R= CH 3 has been investigated. When n= 3 or 4 a major course of reaction is the Type II cleavage. When R= CH 3 and n= 3 a substantial amount of cyclobutanol formation occurs; none is detected when R= C 6 H 5. If n= 2 and R= C 6 H 5 the only photoreactions established are reductive alkylation (by solvent ...