The photochemistry of benzylic sulfonyl compounds: The preparation of sulfones and sulfinic acids

RF Langler, ZA Marini…

文献索引：Langler,R.F. et al. Canadian Journal of Chemistry, 1978 , vol. 56, p. 903 - 907

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被引用次数: 21

摘要

The photolysis of benzylic sulfonyl compounds (XSO2CH2Ph) gives products which are explained in terms of the chemistry of the benzyl and sulfonyl (XSO2) radicals. The synthetic applications of this photocleavage have been examined for two general cases:(i) preparation of sulfones from disulfone precursors, R1SO2CHR2SO2CH2Ph to R1SO2CH2R2 (yields~ 90%);(ii) preparation of sulfinic acids and sulfonyl chlorides from ...