Chemistry of organosilicon compounds. 261. Photochemical 1, 3-silyl migration in allylsilanes occurring with inversion of silyl configuration
M Kira, T Taki, H Sakurai
Index: Kira, Mitsuo; Taki, Takayuki; Sakurai, Hideki Journal of Organic Chemistry, 1989 , vol. 54, # 24 p. 5647 - 5648
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Citation Number: 15
Abstract
Summary: In apparent disagreement with the prediction by the Woodward-Hoffmann rule, facile intramolecular 1,341~ 1 migration of allyl-and propargylsilanes with aromatic substituents at the silicon atom took place reversibly in various solvents under irradiation with 254-nm light, accompanied by the inversion of the silyl configuration.
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