Intermediacy of aryl radicals and arylmetal compounds in reductive dehalogenation of halogenoarenes with lithium aluminium hydride

ALJ Beckwith, SH Goh

Index: Beckwith, Athelstan L. J.; Goh, Swee Hock Journal of the Chemical Society, Chemical Communications, 1983 , # 16 p. 905 - 906

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Citation Number: 4

Abstract

Published on 01 January 1983. Downloaded by google on 17/02/2016 23:35:58. ... View Article Online / Journal Homepage / Table of Contents for this issue ... 6 7 8 9 10 11 12 ... [LAHI/M Conditions" 1.2 NZ OS(LAD) NZ 0.95 Nz, air admitted after 26 h 0.95 1 .o Nz, aire Nz, airf ... 1 .o Nz, hv 1.1 N2, DTBP, hv 0.85 N2, DTBP, hv 0.60( LAD) N,, DTBP, hv 0.09 N,, DTBP, hv lO(slurry) N,, DTBP, hv 1 .O(slurry) NZ ... Time/h 28 64 26 28 21 0.5 2.0 22 1 .o 1.6 1.5 1.3 ...