Advanced Materials (FRG)
2012-12-18
Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved substrates.
Christy D Petruczok, Karen K Gleason
文献索引：Adv. Mater. 24(48) , 6445-50, (2012)
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摘要
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
相关化合物
| 结构式 | 名称/CAS号 | 分子式 | 全部文献 |
|---|---|---|---|
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聚-4-乙烯基吡啶
CAS:25232-41-1 |
(C7H7N)x |
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