Advanced Materials (FRG) 2012-03-02

Enhancement of ferroelectric polarization stability by interface engineering.

H Lu, X Liu, J D Burton, C-W Bark, Y Wang, Y Zhang, D J Kim, A Stamm, P Lukashev, D A Felker, C M Folkman, P Gao, M S Rzchowski, X Q Pan, C-B Eom, E Y Tsymbal, A Gruverman

文献索引：Adv. Mater. 24(9) , 1209-16, (2012)

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摘要

By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.