Sodium Bis (trimethylsilyl) amide and Lithium Diisopropylamide in Deprotection of Alkyl Aryl Ethers: α-Effect of Silicon

…, FF Wong, JJ Huang, SC Tsay

文献索引：Hwu, Jih Ru; Wong, Fung Fuh; Huang, Jiann-Jyh; Tsay, Shwu-Chen Journal of Organic Chemistry, 1997 , vol. 62, # 12 p. 4097 - 4104

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被引用次数: 54

摘要

Removal of methyl, benzyl, and methylene groups from alkyl aryl ethers is among the most popular deprotecting methods in organic synthesis. Alkali organoamides NaN (SiMe3) 2 and LiN (i-Pr) 2, often used as organic bases, have been developed as efficient deprotecting agents. Treatment of aryl methyl ethers with 1.5 equiv of NaN (SiMe3) 2 or LiN (i-Pr) 2 in THF and 1, 3-dimethyl-2-imidazolidinone in a sealed tube at 185° C produced the ...

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