Chemical Communications 2004-04-07

Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer.

Guo-Jun Zhang, Takashi Tanii, Takashi Funatsu, Iwao Ohdomari

文献索引：Chem. Commun. (Camb.) (7) , 786-7, (2004)

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摘要

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.