Advanced Materials (FRG) 2010-06-25

Photocatalytic cleavage of self-assembled organic monolayers by UV-induced charge transfer from GaN substrates.

John Howgate, Sebastian J Schoell, Marco Hoeb, Wiebke Steins, Barbara Baur, Samira Hertrich, Bert Nickel, Ian D Sharp, Martin Stutzmann, Martin Eickhoff

文献索引：Adv. Mater. 22(24) , 2632-6, (2010)

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摘要

结构式	名称/CAS号	分子式	全部文献
	十八烷基三甲氧基硅烷 CAS:3069-42-9	C₂₁H₄₆O₃Si

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Photocatalytic cleavage of self-assembled organic monolayers by UV-induced charge transfer from GaN substrates.

摘要

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