前往化源商城

Photochemistry of trimethyl arsine at 193 nm

…, W Braun, R Klein, W Dorko, H Okabe

文献索引:Fahr, A.; Braun, W.; Klein, R.; Dorko, W.; Okabe, H. Journal of the Chemical Society, Faraday Transactions, 1991 , vol. 87, # 15 p. 2383 - 2389

全文:HTML全文

被引用次数: 9

摘要

The photodecomposition of trimethyl arsine results in fragments/products that exhibit numerous UV overlapping absorptions. Nevertheless, quantum yields of CH3, intramolecular C2H6, As (CH3) and As (CH3) 2 production can be obtained as 1.25, 0, 0.25 and 0.75, respectively, employing both quantitative spectroscopic detection of CH3 at 216.4 nm and GC-mass spectral analysis of isotopically labelled ethane end-products. The ...