… -catalyzed addition polymers for 157 nm resist applications. Synthesis and polymerization of partially fluorinated, ester-functionalized tricyclo [4.2. 1.02, 5] non-7-enes

…, T Chiba, SA MacDonald, CG Willson, W Conley

文献索引：Sanders, Daniel P.; Connor, Eric F.; Grubbs, Robert H.; Hung, Raymond J.; Osborn, Brian P.; Chiba, Takashi; MacDonald, Scott A.; Grant Willson; Conley, Will Macromolecules, 2003 , vol. 36, # 5 p. 1534 - 1542

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被引用次数: 43

摘要

Fluorinated tricyclo [4.2. 1.02, 5] non-7-ene-3-carboxylic acid esters are shown to undergo metal-catalyzed addition polymerization. The resulting homopolymers are transparent at 157 nm and demonstrate the utility of these monomers in development of photoresists for 157 nm lithography. Fluorinated tricyclononene (TCN) structures with ester substituents exhibit up to 3 orders of magnitude more transparency at 157 nm than conventional ester- ...