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Journal of the American Chemical Society

Photochemistry of triarylsulfonium salts

JL Dektar, NP Hacker

文献索引:Dektar, John L.; Hacker, Nigel P. Journal of the American Chemical Society, 1990 , vol. 112, # 16 p. 6004 - 6015

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被引用次数: 274

摘要

Abstract: The photolysis of triphenylsulfonium, tris (4-methylphenyl) sulfonium, tris (4-~ hlorophenyl) sulfonium, several mo-nosubstituted (4-F, 4-Cl, 4-Me, 4-Me0, 4-PhS, and 4- PhCO), and disubstituted (4, 4'-Mez and 4, 4'-(Me0) 2) triphenylsulfonium salts was examined in solution. It was found that direct irradiation of triphenylsulfonium salts produced new rearrangement products, phenylthiobiphenyls, along with diphenyl sulfide, which had ...