Journal of Fluorine Chemistry

Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists

M Wang, W Yueh, KE Gonsalves

文献索引：Wang, Mingxing; Yueh, Wang; Gonsalves, Kenneth E. Journal of Fluorine Chemistry, 2008 , vol. 129, # 7 p. 607 - 612

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被引用次数: 4

摘要

A new series of fluorinated anionic photoacid generators (PAGs)(F4-MBS-TPS, F4VBzBS- TPS, F4-IBBS-TPS, CF3 MBS-TPS, MTFBS-TPS and VBzTFBS-TPS), and corresponding PAG bound polymeric resists (HS-EA-PAG) based on hydroxystyrene (HOST) and 2-ethyl-2- adamantyl methacrylate (EA),(GB-EA-PAG) based on γ-butyrolactone methacrylate (GBLMA) and 2-ethyl-2-adamantyl methacrylate (EA) were prepared and characterized. ...