La polysilylation directe: une voie rapide d'accès à des modèles d'encombrement stérique très élevé

…, JM Leger, DY N'Gabé, C Biran, J Dunoguès

Index: Laguerre, M.; Leger, J. M.; N'Gabe, D. Youhouvoulou; Biran, C.; Dunogues, J. Tetrahedron, 1986 , vol. 42, # 2 p. 669 - 674

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Citation Number: 10

Abstract

Reductive tetrasilylation of t-butyl-, trimethylsilyl-and o-bis (trimethylsilyl) benzenes with Me3SiCl/Li/THF was carried out in high yields, giving the corresponding cyclohexene derivatives [one (1), two (2a and 2b) and one (3) isomers, respectively]. X-Ray structure analysis of 1 and comparison of NMR (1H, 29Si) data of the four products allowed complete structure assignments. The presence of a t-Bu or Me3Si group in the vinylic position ...