High yields of formal CH insertion products in the reactions of polyfluorinated aromatic nitrenes
E Leyva, MJT Young, MS Platz
Index: Leyva, Elisa; Young, Mary Jennifer T.; Platz, Matthew S. Journal of the American Chemical Society, 1986 , vol. 108, p. 8307 - 8309
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Citation Number: 56
Abstract
,, X= 350-nm Rayonet photochemical reactor, 4 h, all products analyzed by GC. b4. 03 XM la and naphthalene (internal standard) in toluene.< Yield includes isomers 4s'. d4. 10 XM la, 2.00 XM 2-acetonaphthone (sensitizer), and naphthalene (internal standard) in toluene, X= 365 nm.'After photolysis, the frozen solution was kept at-196 OC in the dark for 46 h before it was thawed to room temperature.
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