Oxidation of silicon silicon and silicon hydrogen bonds with molecular oxygen and bis (trimethylsilyl) peroxide
K Tamao, M Kumada, T Takahashi
Index: Tamao,K. et al. Journal of Organometallic Chemistry, 1975 , vol. 94, p. 367 - 376
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Citation Number: 38
Abstract
Abstract The silicon silicon bond which is either strained or substituted with more than two fluorine atoms is easily oxidized with molecular oxygen and bis-(trimethylsilyl) peroxide (BSPO) at or below room temperature to form mainly the corresponding disiloxane. The former aerobic oxidation is inhibited by 2, 4, 6-tri (t-butyl) phenol, while the latter is not. Oxidation of the Si H bond with BSPO and the preparation of three new (fluoro) ...
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