Evaluation of FNO and F 3 NO as Substitute Gases for Semiconductor CVD Chamber Cleaning

T Yonemura, K Fukae, Y Ohira, Y Mitsui…

Index: Journal of the Electrochemical Society, , vol. 150, # 11 p. G707-G710

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Citation Number: 4

Abstract

... an unexpected side reaction had occurred in the chamber, and therefore, it was confirmed that it is important to take this property into account in designing applications. © 2003 The Electrochemical Society. All rights reserved. ...