UV laser-induced photolysis of silacyclopent-3-ene: unseparable photochemistry of reactant and product for chemical vapour deposition of Si/C/H polymer

…, A Ouchi, M Urbanová, Y Koga, Z Bastl, J Šubrt

Index: Pola, Josef; Ouchi, Akihiko; Urbanova, Marketa; Koga, Yoshinori; Bastl, Zdenek; Subrt, Jan Journal of Organometallic Chemistry, 1999 , vol. 575, # 2 p. 246 - 250

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Abstract

UV laser-induced photolysis of silacyclopent-3-ene in the gas phase is a clean extrusion of silylene yielding buta-1, 3-diene. Silylene self-polymerisation and consequent deposition of SinH2n agglomerates is precluded by concurrently occurring photolysis of buta-1, 3-diene. The solid polymeric deposit being produced through polymerisation steps involving both H2Si: and the products of the buta-1, 3-diene photolysis makes the reaction suitable for ...