Preparation of vinylsilane from monosilane and vinyl chloride
M Itoh, K Iwata, M Kobayashi
Index: Itoh, Masayoshi; Iwata, Kenji; Kobayashi, Mineo Journal of Organometallic Chemistry, 1999 , vol. 590, # 1 p. 36 - 41
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Abstract
Vinylsilane (CH2 CH SiH3) was prepared by the dehydrochlorination reaction between SiH4 and vinyl chloride. The reactions were carried out in the gas phase at 450–500° C using a tube reactor, and the maximum yield of vinylsilane was 21% when the conversion of SiH4 was 32%. A small amount of CCl4 and CH3NO2 accelerated the reaction. A reaction mechanism involving: SiH2, which was generated by the thermal decomposition of SiH4, ...
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