Photolysis at λ 185 nm of hexamethyldisiloxane in the liquid phase

HP Schuchmann, A Ritter, C von Sonntag

Index: Schuchmann,H.-P. et al. Journal of Organometallic Chemistry, 1978 , vol. 148, p. 213 - 223

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Citation Number: 13

Abstract

Abstract Liquid hexamethyldisiloxane has been photolyzed at 15 C with a low pressure Hg arc (affective wavelength 185 nm). 19 products have been identified and their quantum yields determined. The quantum yields of the three main products are φ [CH 4]= 0.20, φ [C 2 H 6]= 0.045, and φ [(Me 3 Si O SiMe 2) 2]= 0.042. The main event in this photolysis is the rupture of a Si C bond, following the homolytic (i) as well as the molecular mode (ii). ...