Photocleavage of pyridyl-based aromatic polyureas

…, B Yang, R Li, M Morton, F Papadimitrakopoulos

Index: Mwaura, Jeremiah; Yang, Baocheng; Li, Rongfu; Morton, Martha; Papadimitrakopoulos, Fotios Macromolecules, 2003 , vol. 36, # 26 p. 9775 - 9783

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Citation Number: 7

Abstract

The photophysical properties of a metal chelating pyridyl-based aromatic ureas and poly (1, 4-phenylene-2, 6-pyridylurea) were investigated. In their solution state and upon exposure to 365 nm UV radiation, these low and high molecular weight compounds were found to cleave the urea linkage nearly quantitatively, generating the corresponding amine- terminated subunits and CO2. Through a series of model compounds along with nuclear ...