2, 5-Dimethylphenacyl esters: A photoremovable protecting group for carboxylic acids

M Zabadal, AP Pelliccioli, P Klán…

Index: Zabadal, Miroslav; Pelliccioli, Anna Paola; Klan, Petr; Wirz, Jakob Journal of Physical Chemistry A, 2001 , vol. 105, # 45 p. 10329 - 10333

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Citation Number: 44

Abstract

Irradiation of 2, 5-dimethylphenacyl (DMP) esters (1a-c) in benzene or cyclohexane solutions produces the corresponding free carboxylic acids (2a-c) in high chemical yields, along with 6-methyl-1-indanone (3). In methanol, 2-(methoxymethyl)-5-methylacetophenone (4) is formed as a coproduct. Quantum yields for the photorelease of the DMP group are higher in nonpolar solvents, ϕ≈ 0.2, than in methanol, ϕ≈ 0.1. The photoreaction is ...