Temperature-sensitive surfaces prepared by UV photografting reaction of photosensitizer and N-isopropylacrylamide

L Liang, PC Rieke, GE Fryxell, J Liu…

Index: Liang, Liang; Rieke, Peter C.; Fryxell, Glen E.; Liu, Jun; Engehard, Mark H.; Alford, Kentin L. Journal of Physical Chemistry B, 2000 , vol. 104, # 49 p. 11667 - 11673

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Citation Number: 53

Abstract

A thermal-sensitive surface was prepared on the surface of a silicone wafer (substrate) by an ultraviolet photografting reaction between a photosensitizer,(N, N'-diethylamino) dithiocarbamoylpropyl (trimethoxy) silane, and N-isopropylacrylamide. Ellipsometery measurement revealed a thin grafting layer (~ 44 Å) consisting of a single terminal poly (N- isopropylacrylamide)(PNIPAAm) chain on the surface of the silicone wafers. X-ray ...