A series of homoleptic metal amidinates of the general type [M (R-R'AMD) n] x (R= i Pr, t Bu, R'= Me, t Bu) has been prepared and structurally characterized for the transition metals Ti, V, Mn, Fe, Co, Ni, Cu, Ag, and La. The new compounds were found to have properties well- suited for use as precursors for atomic layer deposition (ALD) of thin films: high volatility, high thermal stability, and high and properly self-limited reactivity with molecular hydrogen ...