Site??specific fragmentation following Si: 2p core??level photoexcitation of F3SiCH2Si (CH3) 3 in the vapor phase

…, M Ishikawa, K Takano, U Nagashima…

Index: Nagaoka, Shin-ichi; Ohshita, Joji; Ishikawa, Mitsuo; Takano, Keiko; Nagashima, Umpei; et al. Journal of Chemical Physics, 1995 , vol. 102, # 15 p. 6078 - 6087

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Citation Number: 29

Abstract

Site??specific fragmentation following Si: 2pphotoexcitation of (trifluorosilyl)(trimethylsilyl) methane [F3SiCH2Si (CH3) 3 (FSMSM)] has been studied by means of photoelectron?? photoion and photoion–photoion coincidence techniques. The total photoionization efficiency curve of FSMSM has only one broad peak near the Si: 2p core??ionization threshold and no evidence is obtained for the occurrence of selective excitation of each of ...