Abstract: Photolysis of the high polymer (n-C6H13MeSi), in CC1, leads to the formation of c& indicating that the photodegradative pathway of these polymers includes the formation of silyl radicals. Photolysis of alkyl-substituted polysilane polymers,(RIR2Si)"(R,= n-hexyl, R2= Me; R,= R2= n-hexyl; R,= cyclohexyl, R2= Me), at 254 nm in the presence of triethylsilane gives two major products, Et3Si-RIR2SiH and HR, R2Si-R1R2SiH. Photolysis of (n- ...
